Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660
Ondřej Man
The FEI Helios 660 dual-beam microscope combines a monochromated field emission scanning electron microscope (FE-SEM) with an advanced focused ion beam (FIB) column for fast, precise nanomachining and nanoscale structural characterization.
Electron column/optics specifications
| Electron column type | Elstar UC |
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| Electron source type | Schottky FEG with monochromator |
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| Imaging modes | field free |
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| XHR immersion |
| EDS optimized |
| Beam deceleration (stage bias – 20 V to – 4 kV |
| Probe current | 0.8 pA to 100 nA |
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| Landing energy | 20 eV to 30 keV |
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Ion column/optics specifications
| Ion column type | Tomahawk |
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| Ion source type | Ga LMIS |
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| Probe current | 0.1 pA to 65 nA |
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| Landing energy | 500 eV to 30 keV |
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Detectors available
| Imaging detectors | Analytical detectors | Others |
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| in-lens SE detector (TLD-SE) | energy dispersive spectrometer (EDS) | IR camera for viewing sample/column |
| in-lens BSE detector (TLD-BSE) | electron backscatter diffraction detector (EBSD) | Chamber mounted Nav-Cam+ |
| in-column SE detector (ICD) |
| Integrated beam current measurement |
| in-column BSE detector (MD) |
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| Everhart-Thornley SE detector (ETD) |
| forward-scattered electrons detector (FSD) |
| Retractable low voltage, solid-state backscatter electron detector (DBS) |
| Retractable STEM detector with BF/DF/HAADF segments |
| Secondary electrons/ions detector (ICE) |
Resolution
| Top resolution | Conditions |
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| e-beam | 0.6 nm | 30 kV (STEM) |
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| 0.6 nm | 15 – 2 kV |
| 0.7 nm | 1 kV |
| 1.0 nm | 500 V (ICD) |
| i-beam | 4 nm | 30 kV |
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Sample stage
| Stage type | High precision 5-axes motorized stage |
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| Axis | Maximum movement [mm] |
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| X, Y | 150 (piezo driven) |
| Z | 10 |
| tilt | – 10 ° to + 60 ° |
| rotation | 360 ° continuous |
| Positioning accuracy/repeatability |
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| X, Y repeatability 1 μm |
| Compucentric rotation and tilt |
| tilt accuracy 50° – 54° | 0.1° |
Maximum sample sizes
| Maximum size | 150 mm diameter with full rotation |
| Maximum sample thickness (via loadlock) | ca 9 mm incl. holder (must go through circular opening of a valve) |
| Maximum sample thickness (via chamber door) | ca 55 mm incl. sample holder |
| Weight | 500 g (incl. holder) |
| Please avoid introduction of your samples via chamber door as much as possible! |
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Gas injection system
| Number of GIS channels installed | 2 |
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| Type of precursors available | Carbon, Tungsten |
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Micromanipulator
| Manipulator type | EasyLift EX (FEI) |
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| Available movements | X, Y, Z, rotation |
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Installed utility devices
| Plasma cleaner (mounted on the chamber) |
| Cryo cleaner (mounted on the chamber) |
| Manual loadlock („Quick loader“) |
| Additional cold trap (to be used with CryoMAT) |
Special stage option
| Stage type | CryoMAT (FEI) |
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| Working temperature range | – 190 °C to + 50 °C |
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| Sample size limitations |
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| Max. sample diameter | 10 mm |
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| Max. sample thickness | 5 mm |
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| Special sample shuttle and stubs have to be used! |
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Analytical detectors specifications
| Detector | Parameter | Specified value |
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| EDS | Detector type | EDAX SDD Octane Super |
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| Detector chip area | 60 mm2 |
| Energy resolution-specified | 129 eV @ MnKα |
| Energy resolution-measured | 129.5 eV @ MnKα |
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| EBSD | Detector type | EDAX Hikari XP |
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| Detector camera resolution | 640 (H) x 480 (V) x 14 bits |
| Adjustable gain | 0 – 35 dB |
| Data collection rate | up to 650 indexed pps |
| Minimum operational voltage | 5 kV |
| Minimum beam current | 100 pA |
+420 54114 9207 | 
nano@ceitec.vutbr.cz
